1. Scratch formation and its mechanism in chemical mechanical planarization (CMP)

   • Tae-Young Kwon
   • Manivannan Ramachandran
   • Jin-Goo Park

   Review Article Open access 14 November 2013 Pages: 279 - 305

2. Chemical mechanical polishing: Theory and experiment

   • Dewen Zhao
   • Xinchun Lu

   Review Article Open access 12 December 2013 Pages: 306 - 326

3. Y₂O₃ nanosheets as slurry abrasives for chemical-mechanical planarization of copper

   • Xingliang He
   • Yunyun Chen
   • Hong Liang

   Research Article Open access 20 July 2013 Pages: 327 - 332

4. Towards a unified classification of wear

   • Michael Varenberg

   Research Article Open access 14 November 2013 Pages: 333 - 340

5. Mechanical and tribological properties of epoxy matrix composites modified with microencapsulated mixture of wax lubricant and multi-walled carbon nanotubes

   • Nay Win Khun
   • He Zhang
   • Erjia Liu

   Research Article Open access 14 November 2013 Pages: 341 - 349

6. Hydrophobic, mechanical, and tribological properties of fluorine incorporated hydrogenated fullerene-like carbon films

   • Li Qiang
   • Bin Zhang
   • Junyan Zhang

   Research Article Open access 23 November 2013 Pages: 350 - 358

7. Abrasive-free polishing of hard disk substrate with H₂O₂-C₄H₁₀O₂-Na₂S₂O₅ slurry

   • Weitao Zhang
   • Hong Lei

   Research Article Open access 23 November 2013 Pages: 359 - 366

8. Erratum to: Green tribology: Fundamentals and future development

   • Si-wei Zhang

   Erratum Open access 12 December 2013 Pages: 367 - 367